Multi-piece electrode aperture
View Patent ↗An optics plate for an ion implantation system, the optics plate comprising a pair of aperture assemblies. Each pair of aperture assemblies respectively comprises a first aperture member, a second aperture member; and an aperture fastener, wherein the aperture fastener fastens the first aperture member to the second aperture member. An aperture tip may be also fastened to the second aperture member. One or more of the first aperture member, second aperture member, aperture tip, and aperture fastener is made of one or more of a refractory metal, tungsten, lanthanated tungsten alloy, yttrium tungsten alloy, and/or graphite and silicon carbide. The aperture assemblies may define an extraction electrode assembly, a ground electrode assembly, or other electrode assembly in the ion implantation system. The aperture fastener may be a screw and a bevel washer. The first aperture member may be operably coupled to a base plate via an aperture assembly fastener.
1. An optics plate for an ion implantation system, the optics plate comprising:
a pair of aperture assemblies, each pair of aperture assemblies respectively comprising:
a first aperture member;
a second aperture member; and
an aperture fastener, wherein the aperture fastener selectively couples the first aperture member to the second aperture member.
2. The optics plate of claim 1 , wherein one or more of the first aperture member, second aperture member, and aperture fastener comprises one or more of a refractory metal, tungsten, tungsten lanthanum alloy, tungsten yttrium alloy, graphite and silicon carbide.
3. The optics plate of claim 1 , wherein the aperture fastener is comprised of a refractory metal.
4. The optics plate of claim 1 , wherein the pair of aperture assemblies define an extraction electrode assembly.
5. The optics plate of claim 1 , wherein the pair of aperture assemblies define a ground electrode assembly.
6. The optics plate of claim 1 , wherein the aperture fastener comprises a screw and a bevel washer.
7. The optics plate of claim 1 , further comprising a base plate, wherein the first aperture member is operably coupled to the base plate via an aperture assembly fastener.
8. The optics plate of claim 1 , wherein the first aperture member is comprised of graphite or silicon carbide, and the second aperture member is comprised of one or more of a refractory metal, tungsten, tungsten lanthanum alloy, and tungsten yttrium alloy.
9. The optics plate of claim 1 , further comprising a tip selectively coupled to the second aperture member.
10. An ion implantation system, comprising:
an ion source configured to form an ion beam; and
an optics plate configured to be exposed to the ion beam, the optics plate, comprising:
a pair of aperture assemblies, each pair of aperture assemblies respectively comprising:
a first aperture member;
a second aperture member; and
an aperture fastener, wherein the aperture fastener selectively couples the first aperture member to the second aperture member.
11. The ion implantation system of claim 10 , wherein one or more of the first aperture member, second aperture member, and aperture fastener comprises one or more of a refractory metal, tungsten, tungsten lanthanum alloy, tungsten yttrium alloy, graphite or silicon carbide.
12. The ion implantation system of claim 10 , wherein the aperture fastener is comprised of a refractory metal.
13. The ion implantation system of claim 10 , wherein the pair of aperture assemblies define an extraction electrode assembly.
14. The ion implantation system of claim 10 , wherein the pair of aperture assemblies define a ground electrode assembly.
15. The ion implantation system of claim 10 , wherein the aperture fastener comprises a screw and a bevel washer.
16. The ion implantation system of claim 10 , further comprising a base plate, wherein the first aperture member is operably coupled to the base plate via an aperture assembly fastener.
17. The ion implantation system of claim 10 , wherein the first aperture member is comprised of graphite or silicon carbide, and the second aperture member is comprised of one or more of a refractory metal, tungsten, tungsten lanthanum alloy, and tungsten yttrium alloy.
18. The ion implantation system of claim 10 , further comprising a tip selectively coupled to the second aperture member, wherein the tip is primarily exposed to the ion beam.