Graphene contacts on source/drain regions of FinFET devices

1. A FinFET device, comprising:

a fin formed in a semiconductor substrate, said semiconductor substrate comprising a first semiconductor material;

a gate structure positioned above a portion of said fin;

source and drain regions positioned on opposite sides of said gate structure;

a silicon-carbide (SiC) semiconductor material positioned above said fin in said source region and said drain region, wherein said silicon-carbide (SiC) semiconductor material is different from said first semiconductor material;

a graphene contact positioned on and in direct physical contact with said silicon-carbide (SiC) semiconductor material in each of said source region and said drain region; and

first and second contact structures that are conductively coupled to said graphene contacts in said source region and said drain region, respectively.

2. The FinFET device of claim 1 , wherein said first silicon-carbide (SiC) semiconductor material comprises one of 3C—SiC, a carbon-doped silicon, a hydrogen-rich carbon-doped silicon, an amorphous silicon-carbide, and a polycrystalline silicon-carbide.

3. The FinFET device of claim 1 , further comprising a second semiconductor material positioned between said fin and said silicon-carbide (SiC) semiconductor material, wherein said second semiconductor material is different from said first semiconductor material, and wherein said silicon-carbide (SiC) semiconductor material is positioned on and in direct physical contact with said second semiconductor material.

4. The FinFET device of claim 1 , wherein said fin is made entirely of said first semiconductor material.

5. The FinFET device of claim 4 , wherein said silicon-carbide (SiC) semiconductor material is positioned on and in direct physical contact with said first semiconductor material of said fin.

6. The FinFET device of claim 1 , wherein a lower portion of said fin comprises said first semiconductor material and an upper portion of said fin comprises a third semiconductor material that is different from said first semiconductor material.

7. The FinFET device of claim 6 , wherein said third semiconductor material comprises one of silicon germanium (Si x Ge (1-x) , where x ranges from approximately 0.1 to approximately 0.9) and a III-V semiconductor material.

8. The FinFET device of claim 1 , wherein said gate structure is a replacement gate structure for said FinFET device.

9. A FinFET device, comprising:

a fin formed in a semiconductor substrate, said semiconductor substrate comprising a first semiconductor material;

a gate structure positioned above a portion of said fin;

source and drain regions positioned on opposite sides of said gate structure;

a second semiconductor material positioned above said fin in said source region and said drain region, wherein said second semiconductor material is different from said first semiconductor material;

a silicon-carbide (SiC) semiconductor material positioned above said fin in said source region and said drain region, wherein said silicon-carbide (SiC) semiconductor material is different from said first semiconductor material;

a graphene contact positioned on and in direct physical contact with said silicon-carbide (SiC) semiconductor material in each of said source region and said drain region; and

first and second contact structures that are conductively coupled to said graphene contacts in said source region and said drain region, respectively.

10. The FinFET device of claim 9 , wherein said silicon-carbide (SiC) semiconductor material is positioned on and in direct physical contact with said second semiconductor material in said source and drain regions.

11. The FinFET device of claim 9 , wherein said FinFET device is a PMOS FinFET device and said second semiconductor material comprises silicon germanium (Si x Ge (1-x) , where x ranges from approximately 0.1 to approximately 0.9).

12. The FinFET device of claim 9 , wherein said fin is made entirely of said first semiconductor material.

13. The FinFET device of claim 9 , wherein a lower portion of said fin comprises said first semiconductor material and an upper portion of said fin comprises a third semiconductor material that is different from said first semiconductor material.

14. The FinFET device of claim 13 , wherein said third semiconductor material comprises one of silicon germanium (Si x Ge (1-x) , where x ranges approximately 0.1 to approximately 0.9) and a III-V semiconductor material.

15. An integrated circuit product, comprising

a first fin of a PMOS FinFET device formed in a semiconductor substrate, said semiconductor substrate comprising a first semiconductor material;

a first gate structure of said PMOS FinFET device positioned above a portion of said first fin;

first source and drain regions of said PMOS FinFET device positioned on opposite sides of said first gate structure;

a second fin of an NMOS FinFET device formed in said semiconductor substrate;

a second gate structure of said NMOS FinFET device positioned above a portion of said second fin;

second source and drain regions of said NMOS FinFET device positioned on opposite sides of said second gate structure;

a second semiconductor material positioned on said first fin in said first source and drain regions of said PMOS FinFET device, wherein said second semiconductor material is different from said first semiconductor material;

a third semiconductor material positioned on said second fin in said second source and drain regions of said NMOS FinFET device, wherein said third semiconductor material is different from said first and second semiconductor materials;

a silicon-carbide (SiC) semiconductor material positioned on and in direct physical contact with said second semiconductor material in said first source and drain regions of said PMOS FinFET device and on and in direct physical contact with said third semiconductor material in said second source and drain regions of said NMOS FinFET device, said silicon-carbide (SiC) semiconductor material being different from said first semiconductor material;

a graphene contact positioned on and in direct physical contact with said silicon-carbide (SiC) semiconductor material in each of said first source and drain regions of said PMOS FinFET device and in said second source and drain regions of said NMOS FinFET device; and

a plurality of contact structures, wherein each of said plurality of contact structures is conductively coupled to a respective one of said graphene contacts.

16. The integrated circuit product of claim 15 , wherein said second semiconductor material comprises silicon germanium (Si x Ge (1-x) , where x ranges from approximately 0.1 to approximately 0.9).

17. The integrated circuit product of claim 16 , wherein said third semiconductor material comprises silicon-carbide (SiC).

18. The integrated circuit product of claim 15 , wherein said first and second fins are made entirely of said first semiconductor material.

19. The integrated circuit product of claim 15 , wherein a lower portion of each of said first and second fins is made of said first semiconductor material and an upper portion of each of said first and second fins is made of a fourth semiconductor material that is different from said first semiconductor material.

20. The integrated circuit product of claim 19 , wherein said fourth semiconductor material comprises one of silicon germanium (Si x Ge (1-x) , where x ranges from 0.1 to about 0.9) and a III-V semiconductor material.