Method and device for reducing metal burrs when sawing semiconductor packages
A semiconductor device has a substrate. A conductive layer is formed over the substrate and includes a ground plane. A first tab of the conductive layer extends from the ground plane and less than half-way across a saw street of the substrate. A shape of the first tab can include elliptical, triangular, parallelogram, or rectangular portions, or any combination thereof. An encapsulant is deposited over the substrate. The encapsulant and substrate are singulated through the saw street. An electromagnetic interference (EMI) shielding layer is formed over the encapsulant. The EMI shielding layer contacts the first tab of the conductive layer.
1. A method of making a semiconductor device, comprising:
providing a substrate;
forming a conductive layer over the substrate with a first tab of the conductive layer including,
a rectangular portion disposed completely outside a saw street of the substrate, and
a thinning portion extending from the rectangular portion and less than half-way across a saw street of the substrate;
depositing an encapsulant over the substrate;
singulating the encapsulant and substrate through the saw street and thinning portion of the first tab to remove an end of the first tab, wherein the thinning portion is only partially removed by the singulating step; and
forming an electromagnetic interference (EMI) shielding layer over the encapsulant, wherein the EMI shielding layer contacts the first tab of the conductive layer.
2. The method of claim 1 , wherein forming the first conductive layer includes:
forming a first ground plane; and
forming the rectangular portion of the first tab extending from the first ground plane.
3. The method of claim 2 , wherein forming the first conductive layer further includes:
forming a second ground plane; and
forming a second tab extending from the second ground plane to within the saw street directly across from the first tab without contacting the first tab.
4. The method of claim 1 , further including forming the thinning portion of the first tab is triangular shaped.
5. The method of claim 1 , further including mounting a plurality of electrical components on the substrate, wherein the electrical components are electrically coupled to each other through the substrate.
6. The method of claim 1 , wherein a width of the rectangular portion is equal to a first width of the thinning portion where the rectangular portion meets the thinning portion, and wherein a second width of the thinning portion within the saw street is less than the first width of the thinning portion.
7. A method of making a semiconductor device, comprising:
providing a substrate including a first conductive layer comprising a first tab of the first conductive layer extending partially across a saw street of the substrate, wherein the first tab includes,
a rectangular portion completely outside of the saw street, and
a thinning portion extending from the rectangular portion to within the saw street;
depositing an encapsulant over the substrate;
singulating the encapsulant and substrate through the saw street and thinning portion; and
forming a second conductive layer over a side of the substrate and in contact with the first tab of the first conductive layer.
8. The method of claim 7 , wherein the first conductive layer further comprises a second tab extending into the saw street across from the first tab.
9. The method of claim 7 , wherein the first conductive layer further includes a ground plane with the rectangular portion of the first tab extending from the ground plane.
10. The method of claim 7 , wherein the first tab extends less than half-way across the saw street of the substrate.
11. The method of claim 7 , further including singulating the encapsulant and substrate through the saw street using a saw.
12. The method of claim 7 , further including forming a conductive bump over the first conductive layer and electrically coupled to the second conductive layer through the tab.
13. The method of claim 7 , wherein the thinning portion of the first tab is elliptical shaped.
14. A method of making a semiconductor device, comprising:
providing a substrate including a first conductive layer comprising,
a ground plane, and
a first tab extending partially across a saw street of the substrate, wherein the first tab includes a first width where the first tab meets the ground plane and a second width less than the first width within the saw street;
singulating the substrate through the saw street; and
forming a second conductive layer over a side of the substrate.
15. The method of claim 14 , further including:
disposing a semiconductor die over the substrate; and
depositing an encapsulant over the substrate and semiconductor die.
16. The method of claim 14 , wherein the first conductive layer further comprises a second tab in the saw street directly across from the first tab.
17. The method of claim 14 , wherein the first tab includes a parallelogram portion extending into the saw street.
18. The method of claim 17 , wherein the first tab includes a rectangular portion outside the saw street.
19. The method of claim 14 , further including forming the second conductive layer in direct physical contact with the tab of the first conductive layer.
20. A method of making a semiconductor device, comprising:
providing a substrate comprising a saw street; and
forming a first ground plane over the substrate including a plurality of first tabs extending from the first ground plane into the saw street, wherein each of the plurality of tabs includes an end disposed within the saw street, and wherein a width of each of the plurality of tabs is reduced from the first ground plane to the end of the respective tab.
21. The method of claim 20 , further including forming the first tabs to each include an elliptical portion.
22. The method of claim 20 , further including forming the first tabs to each include a triangular portion.
23. The method of claim 20 , further including forming a second ground plane over the substrate with the saw street between the first ground plane and second ground plane, wherein a plurality of second tabs of the second ground plane extends into the saw street and the plurality of second tabs are formed offset from the first plurality of first tabs.
24. The method of claim 20 , further including forming a second ground plane over the substrate with the saw street between the first ground plane and second ground plane, wherein a plurality of second tabs of the second ground plane extends into the saw street with each of the plurality of second tabs directly across from a respective one of the plurality of first tabs.
25. The method of claim 23 , wherein the first ground plane is devoid of first tabs directly across the saw street from each of the second tabs and the second ground plane is devoid of second tabs directly across the saw street from each of the first tabs.