IP Library Granted Patent US 10,734,322
Granted Patent B2
US 10,734,322 · App. 16/677,575 · Granted Aug 4, 2020

Through-holes of a semiconductor chip

Inventor: Akihiko Hatasawa (Tokyo, JP)
Assignee: Longitude Licensing Limited
H01L23/5385H01L21/76877H01L21/76898H01L23/3135H01L23/481H01L23/53228H01L24/17H01L24/73H01L24/97H01L25/065H01L25/0657H01L25/07H01L25/50H01L21/561H01L21/568H01L23/3128H01L24/11H01L24/27H01L24/32H01L25/18H01L2224/05556H01L2224/05571H01L2224/06181H01L2224/16145H01L2224/16146H01L2224/16147H01L2224/16225H01L2224/32145H01L2224/32225H01L2224/73204H01L2224/81191H01L2225/06513H01L2225/06517H01L2225/06541H01L2225/06544H01L2924/15311H01L2924/181H01L2924/351
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Quick Facts
Patent No.
US 10,734,322
App. No.
16/677,575
Granted
Aug 4, 2020
Kind
B2
Abstract

One semiconductor chip includes a substrate having insulation properties, a plurality of bump electrodes provided on one surface of the substrate, a plurality of recesses provided in the other surface of the substrate, and a solder layer disposed within the recesses. The recesses are formed such that the area of the opening decreases from the other surface side toward the one surface side of the substrate.

Claims (22)

1. A semiconductor chip comprising:

a semiconductor substrate having a first face and an opposite second face;

a circuit forming layer disposed on the first face of the semiconductor substrate; and

a plurality of penetration electrodes passing through the semiconductor substrate from the first face to the second face, wherein each of the penetration electrodes comprises:

a first portion forming a main portion of the penetration electrode and formed in a first conical shape extending from the first face towards the second face; and

a second portion formed in a second conical shape extending from the first portion towards the second face, wherein the first conical shape decreases with a first reduction ratio towards the first face, the second conical shape decreases with a second reduction ratio that is larger than the first reduction ratio towards the first face.

2. The semiconductor chip of claim 1 , wherein the second portion is provided between the first portion and the second face of the semiconductor substrate.

3. The semiconductor chip of claim 2 , wherein the second portion is made of a solder layer.

4. The semiconductor chip of claim 3 , wherein the solder layer comprises tin, silver, or a combination thereof.

5. The semiconductor chip of claim 1 , wherein the first portion is made of copper.

6. A semiconductor chip comprising:

a semiconductor substrate having a first face and an opposite second face;

a circuit forming layer disposed on the first face of the semiconductor substrate; and

through-holes passing through the semiconductor substrate from the first face of the semiconductor substrate to the second face of the semiconductor substrate, wherein each of the through-holes comprises:

a first aperture forming a main portion of the through-hole and extending from the first face into an interior of the semiconductor substrate; and

a second aperture provided between the first aperture and the second face, wherein a first aperture area of the first aperture decreases with a first reduction ratio towards the first face, a second aperture area of the second aperture decreases with a second reduction ratio that is bigger than the first reduction ratio towards the first face, the first and second apertures are formed with a conical shape.

7. The semiconductor chip of claim 6 , further comprising a solder layer arranged within the second aperture.

8. The semiconductor chip of claim 7 , wherein the solder layer completely fills the second aperture.

9. The semiconductor chip of claim 8 , wherein the solder layer comprises tin, silver, or a combination thereof.

10. The semiconductor chip of claim 6 , further comprising a conductive layer arranged within the first aperture.

11. The semiconductor chip of claim 10 , wherein the conductive layer completely fills the first aperture.

12. The semiconductor chip of claim 11 , wherein the conductive layer is made of copper.

Priority Claims (1)
JP 2013-051849 · Mar 14, 2013 · national
Continuity (3)
Continuation 16157933 · Oct 11, 2018
Continuation 14775112
Related Publication 20200075494A1 · Mar 5, 2020
Cited By (1)
US 12,315,818