Scan and corrector magnet designs for high throughput scanned beam ion implanter
An ion implantation system and method provide a non-uniform flux of a ribbon ion beam. A spot ion beam is formed and provided to a scanner, and a scan waveform having a time-varying potential is applied to the scanner. The ion beam is scanned by the scanner across a scan path, generally defining a scanned ion beam comprised of a plurality of beamlets. The scanned beam is then passed through a corrector apparatus. The corrector apparatus is configured to direct the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece. The corrector apparatus further comprises a plurality of magnetic poles configured to provide a non-uniform flux profile of the scanned ion beam at the workpiece.
1. An ion implantation system, comprising:
an ion source configured to form an ion beam;
a mass analyzer configured to mass analyze the ion beam;
a power source configured to provide a scan waveform;
a scanner configured to selectively scan the ion beam along a scan path based on the scan waveform, therein defining a scanned ion beam; and
a corrector apparatus configured to transport the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece, wherein one or more of the scanner and corrector apparatus are configured to provide the scanned ion beam having a flux that increases from a first beam flux associated with a central region of the workpiece to a second beam flux associated with an edge of the workpiece.
2. The ion implantation system of claim 1 , wherein the corrector apparatus comprises a plurality of magnetic poles configured to define a non-uniform flux profile of the scanned ion beam at the workpiece.
3. The ion implantation system of claim 2 , wherein the non-uniform flux profile is generally defined by the first beam flux associated with the edge of the workpiece and the second beam flux associated with the central region of the workpiece.
4. The ion implantation system of claim 3 , wherein the first beam flux is between 10% and 100% greater than the second beam flux.
5. The ion implantation system of claim 2 , wherein the non-uniform flux profile comprises the flux being generally uniform over the central region of the workpiece and increases at the edge of the workpiece, where the central region represents between 20% and 80% of a length of the workpiece.
6. The ion implantation system of claim 2 , wherein the non-uniform flux profile is generally parabolic.
7. The ion implantation system of claim 2 , further comprising a controller configured to control the non-uniform flux profile via a control of one or more of the scanner and corrector apparatus.
8. The ion implantation system of claim 1 , wherein the corrector apparatus comprises a pair of opposite polarity dipole magnets in an s-bend configuration.
9. An ion implantation system, comprising:
an ion source configured to form an ion beam;
a mass analyzer configured to mass analyze the ion beam;
a scanner power source configured to provide a scan waveform;
a scanner configured to selectively scan the ion beam along a scan path based on the scan waveform, therein defining a scanned ion beam; and
a corrector apparatus configured to transport the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece, wherein one or more of the scanner and corrector apparatus are configured to provide the scanned ion beam having a non-uniform flux profile without modifying the scan waveform as the ion beam is scanned across the workpiece.
10. The ion implantation system of claim 9 , further comprising a controller configured to control the non-uniform flux profile via a control of one or more of the scanner and corrector apparatus.
11. The ion implantation system of claim 10 , wherein controller is further configured to control the scanner power source such that the scanner is further configured to provide the non-uniform flux profile of the scanned ion beam at the workpiece.
12. The ion implantation system of claim 9 , wherein the scanner comprises a magnetic scanner.
13. The ion implantation system of claim 9 , wherein the corrector apparatus comprises a pair of opposite polarity dipole magnets in an s-bend configuration.
14. The ion implantation system of claim 9 , wherein a flux at an edge of the workpiece is between 10% and 100% greater than the flux at a center of the workpiece.
15. The ion implantation system of claim 9 , wherein the non-uniform flux profile is generally parabolic.
16. The ion implantation system of claim 9 , wherein the non-uniform flux profile is substantially uniform over a central region and increases at an edge of the workpiece, where the central region represents between 20% and 80% of a length of the workpiece.
17. The ion implantation system of claim 9 , wherein the corrector apparatus comprises a plurality of magnetic poles configured to define the non-uniform flux profile of the scanned ion beam at the workpiece.
18. A method for providing a non-uniform flux of a scanned ribbon ion beam, the method comprising:
providing an ion beam to a scanner;
providing a scan waveform having a time-varying potential to the scanner, therein scanning the ion beam across a scan path and generally defining a scanned ion beam comprised of a plurality of beamlets; and
passing the scanned ion beam through a corrector apparatus, wherein the corrector apparatus is configured to direct the scanned ion beam toward a workpiece at a generally constant angle of incidence across the workpiece, and wherein the corrector apparatus is further configured to provide a non-uniform flux profile of the scanned ion beam at the workpiece without modifying the scan waveform.
19. The method of claim 18 , wherein the time-varying potential relates to at least one of a time-varying voltage or a time-varying magnetic field.
20. The method of claim 18 , wherein a flux of the ion beam at an edge of the workpiece is between 10% and 100% greater than the flux of the ion beam at a center of the workpiece.