SEMICONDUCTOR CAPACITOR DEVICES AND METHODS
Implementations of a pixel may include at least one photodiode coupled with a floating diffusion; a first metal-insulator-metal (MIM) capacitor including a first electrode and a second electrode; and a second MIM capacitor coupled in parallel with the first MIM capacitor, the second MIM capacitor including a first electrode and a second electrode. The first MIM capacitor and second MIM capacitor may be coupled with the floating diffusion.
1 . A pixel comprising:
at least one photodiode coupled with a floating diffusion;
a first metal-insulator-metal (MIM) capacitor comprising a first electrode and a second electrode; and
a second MIM capacitor coupled in parallel with the first MIM capacitor, the second MIM capacitor comprising a first electrode and a second electrode;
wherein the first MIM capacitor and second MIM capacitor are coupled with the floating diffusion.
2 . The pixel of claim 1 , wherein:
the first electrode of the first MIM capacitor is coupled to the second electrode of the second MIM capacitor; and
the second electrode of the first MIM capacitor is coupled to the first electrode of the second MIM capacitor.
3 . The pixel of claim 2 , wherein the first MIM capacitor and second MIM capacitor are coupled to permit space-charge drift in the first MIM capacitor and space-charge drift in the second MIM capacitor to cancel.
4 . The pixel of claim 1 , further comprising a high-K dielectric material comprised between the first electrode and the second electrode of the first MIM capacitor and between the first electrode and the second electrode of the second MIM capacitor.
5 . The pixel of claim 4 , wherein the high-K dielectric material comprises one of a single material layer or multiple material layers.
6 . The pixel of claim 4 , wherein the high-K dielectric material is one of hafnium oxide, aluminum oxide, lanthanum oxide, or any combination thereof.
7 . The pixel of claim 1 , wherein the first electrode of the first MIM capacitor and the first electrode of the second MIM capacitor are formed at the same time and the second electrode of the first MIM capacitor and the second electrode of the second MIM capacitor are formed at the same time.
8 . A pixel comprising:
at least one photodiode coupled with a floating diffusion;
a first metal-insulator-metal (MIM) capacitor comprising a first electrode and a second electrode; and
a second MIM capacitor coupled in series with the first MIM capacitor, the second MIM capacitor comprising a first electrode and a second electrode;
wherein the first MIM capacitor and second MIM capacitor are coupled with the floating diffusion.
9 . The pixel of claim 8 , wherein the first electrode of the first MIM capacitor is coupled to the first electrode of the second MIM capacitor.
10 . The pixel of claim 9 , wherein the first MIM capacitor and second MIM capacitor are coupled to permit space-charge drift in the first MIM capacitor and space-charge drift in the second MIM capacitor to cancel.
11 . The pixel of claim 8 , further comprising a high-K dielectric material comprised between the first electrode and the second electrode of the first MIM capacitor and between the first electrode and the second electrode of the second MIM capacitor.
12 . The pixel of claim 11 , wherein the high-K dielectric material comprises one of a single material layer or multiple material layers.
13 . The pixel of claim 11 , wherein the high-K dielectric material is one of hafnium oxide, aluminum oxide, lanthanum oxide, or any combination thereof.
14 . The pixel of claim 8 , wherein the first electrode of the first MIM capacitor and the first electrode of the second MIM capacitor are formed at the same time and the second electrode of the first MIM capacitor and the second electrode of the second MIM capacitor are formed at the same time.
15 . A pixel system comprising:
at least one photodiode coupled with transfer gate coupled with a floating diffusion;
a first metal-insulator-metal (MIM) capacitor comprising a first electrode and a second electrode;
a second MIM capacitor coupled with the first MIM capacitor, the second MIM capacitor comprising a first electrode and a second electrode; and
a dual conversion gate node coupled with the second electrode of the first MIM capacitor and with the first electrode of the second MIM capacitor;
wherein a voltage of the dual conversion gate node is between a voltage of the first electrode of the first MIM capacitor and a voltage of the second electrode of the second MIM capacitor.
16 . The system of claim 15 , wherein the voltage of the first electrode of the first MIM capacitor is maintained at a higher voltage value than a range of possible voltage values of the dual conversion gate node.
17 . The system of claim 15 , wherein:
the second electrode of the second MIM capacitor is maintained at a lower voltage value than a range of possible voltage values of the dual conversion gate node.
18 . The system of claim 15 , wherein opposite rates of change in an electric field in the first MIM capacitor and the second MIM capacitor to minimize an observed charging lag effect or an observed discharging lag effect.
19 . The system of claim 15 , further comprising a high-K dielectric material comprised between the first electrode and the second electrode of the first MIM capacitor and between the first electrode and the second electrode of the second MIM capacitor.
20 . The system of claim 15 , wherein the floating diffusion has a capacitance smaller than a sum of a capacitance of the first MIM capacitor and a capacitance of the second MIM capacitor.