GROWTH DEFECT REDUCTION AT GRATING TRANSITION
A semiconductor device. In some embodiments, the semiconductor device includes: a first layer having a first region and a second region, the first region being corrugated with a plurality of corrugations, the second region being uncorrugated. A first cycle of the corrugations may have a first duty cycle and a second cycle of the corrugations may have a second duty cycle, the second cycle being between the first cycle and the second region, and the second duty cycle being between the first duty cycle and the duty cycle of the second region.
1 . A semiconductor device, comprising:
a first layer having a first region and a second region,
the first region being corrugated with a plurality of corrugations,
the second region being uncorrugated,
a first cycle of the corrugations having a first duty cycle,
a second cycle of the corrugations having a second duty cycle,
the second cycle being between the first cycle and the second region, and
the second duty cycle being between the first duty cycle and the duty cycle of the second region.
2 . The semiconductor device of claim 1 , comprising a distributed feedback laser, the distributed feedback laser comprising:
the first region of the first layer, and
the second region of the first layer.
3 . The semiconductor device of claim 1 , further comprising a plurality of quantum well layers on the first layer.
4 . The semiconductor device of claim 1 , further comprising a plurality of quantum well layers under the first layer.
5 . The semiconductor device of claim 1 , further comprising an etch stop layer on the first layer.
6 . The semiconductor device of claim 1 , wherein:
the duty cycle of each cycle of the corrugations differs by at most 0.7 from the duty cycle of an adjacent cycle of the corrugations, and
the duty cycle of the cycle nearest the second region differs by at most 0.7 from the duty cycle of the second region.
7 . The semiconductor device of claim 1 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a piecewise linear function of distance along the length of the device.
8 . The semiconductor device of claim 1 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a piecewise constant function of distance along the length of the device.
9 . The semiconductor device of claim 1 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a function of distance along the length of the device, the function having a continuous first derivative.
10 . The semiconductor device of claim 1 , wherein the products of:
the duty cycles and
the corresponding fractional etch depths
of the cycles of the corrugations follow, to within 0.2, a piecewise linear function of distance along the length of the device.
11 . A method for fabricating a semiconductor device, the method comprising:
forming a first layer on a substrate;
removing portions of the first layer; and
forming a planarization layer on the first layer,
the first layer having, after the removing of portions of the first layer, a first region and a second region,
the first region being corrugated with a plurality of corrugations,
the second region being uncorrugated,
a first cycle of the corrugations having a first duty cycle,
a second cycle of the corrugations having a second duty cycle,
the second cycle being between the first cycle and the second region, and
the second duty cycle being between the first duty cycle and the duty cycle of the second region.
12 . The method of claim 11 , wherein the semiconductor device is a distributed feedback laser, the distributed feedback laser comprising:
the first region of the first layer, and
the second region of the first layer.
13 . The method of claim 11 , further comprising forming a plurality of quantum well layers on the substrate, after the forming the planarization layer.
14 . The method of claim 11 , further comprising forming a plurality of quantum well layers on the substrate, before the forming of the first layer.
15 . The method of claim 11 , further comprising forming an etch stop layer on the first layer.
16 . The method of claim 11 , wherein:
the duty cycle of each cycle of the corrugations differs by at most 0.7 from the duty cycle of an adjacent cycle of the corrugations, and
the duty cycle of the cycle nearest the second region differs by at most 0.7 from the duty cycle of the second region.
17 . The method of claim 11 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a piecewise linear function of distance along the length of the device.
18 . The method of claim 11 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a piecewise constant function of distance along the length of the device.
19 . The method of claim 11 , wherein the duty cycles of the cycles of the corrugations follow, to within 0.2, a function of distance along the length of the device, the function having a continuous first derivative.
20 . The method of claim 11 , wherein the removing of portions of the first layer comprises etching each of the portions to a respective etch depth.
21 . The method of claim 20 , wherein the products of:
the duty cycles and
the corresponding fractional etch depths
of the cycles of the corrugations follow, to within 0.2, a piecewise linear function of distance along the length of the device.