OPTICAL INSPECTION TOOL INCLUDING FIELD APERTURE SYSTEM HAVING DIFFERENT TRANSMITTANCE FOR DIFFERENT RADIATION WAVELENGTHS AND METHOD OF USING THEREOF
A method of inspecting a device under test includes transmitting an emitted autofocus beam to the device under test and a reflected autofocus beam reflected from the device under test through a center opening region and a peripheral blocking plate region of a field aperture, and transmitting an emitted inspection beam to the device under test and a reflected inspection beam reflected from the device under test through the center opening region. The emitted inspection beam and the reflected inspection beam are blocked by the peripheral blocking plate region.
1 . An optical inspection tool, comprising:
a stage comprising a top surface for supporting a device under test and configured to move the device under test;
an inspection beam source configured to generate an emitted inspection beam;
an autofocus beam source configured to generate an emitted autofocus beam; and
an optics assembly configured to direct the emitted inspection beam and the emitted autofocus beam toward the device under test, wherein the optics assembly comprises a field aperture including a center opening region and a peripheral blocking plate region that provides a first transmittance less than 0.2 for the emitted inspection beam and provides a second transmittance greater than 0.8 for the emitted autofocus beam.
2 . The optical inspection tool of claim 1 , wherein the center opening region is not filled with any solid phase material or with any liquid phase material.
3 . The optical inspection tool of claim 1 , wherein the center opening region comprises a solid material which is transparent to both the emitted inspection beam and the emitted autofocus beam.
4 . The optical inspection tool of claim 1 , wherein the peripheral blocking plate region comprises a multilayer stack of films configured to reflect radiation at a peak wavelength of the emitted inspection beam with a reflectivity greater than 0.8.
5 . The optical inspection tool of claim 1 , wherein the peripheral blocking plate region comprises a dichroic mirror that provides the first transmittance less than 0.2 for the emitted inspection beam and provides the second transmittance greater than 0.8 for the emitted autofocus beam.
6 . The optical inspection tool of claim 1 , wherein:
the inspection beam source is configured to generate the emitted inspection beam having a first peak wavelength; and
the autofocus beam source is configured to generate the emitted autofocus beam having a second peak wavelength different from the first peak wavelength.
7 . The optical inspection tool of claim 6 , wherein the second peak wavelength is longer than the first peak wavelength.
8 . The optical inspection tool of claim 1 , wherein the optics assembly further comprises a dichroic mirror configured to reflect a first segment of the emitted inspection beam that is emitted from the inspection beam source toward the field aperture.
9 . The optical inspection tool of claim 8 , wherein the dichroic mirror is configured to transmit a reflected autofocus beam that is reflected from the device under test and passes through the field aperture.
10 . The optical inspection tool of claim 9 , further comprising:
an image capture device; and
an autofocus beam detector located on a distal side of the dichroic mirror.
11 . A method of inspecting a device under test, comprising:
transmitting an emitted autofocus beam to the device under test and a reflected autofocus beam reflected from the device under test through a center opening region and a peripheral blocking plate region of a field aperture; and
transmitting an emitted inspection beam to the device under test and a reflected inspection beam reflected from the device under test through the center opening region, wherein the emitted inspection beam and the reflected inspection beam are blocked by the peripheral blocking plate region.
12 . The method of claim 11 , wherein the peripheral blocking plate region that provides a first transmittance less than 0.2 for the emitted inspection beam and provides a second transmittance greater than 0.8 for the emitted autofocus beam.
13 . The method of claim 12 , wherein the peripheral blocking plate region comprises a dichroic mirror that provides the first transmittance less than 0.2 for the emitted inspection beam and provides the second transmittance greater than 0.8 for the emitted autofocus beam.
14 . The method of claim 11 , wherein the center opening region is not filled with any solid phase material or with any liquid phase material.
15 . The method of claim 11 , wherein the center opening region comprises a solid material which is transparent to both the emitted inspection beam and the emitted autofocus beam.
16 . The method claim 11 , wherein:
the emitted inspection beam comprises radiation having a first peak wavelength; and
the emitted autofocus beam comprises radiation having a second peak wavelength different from the first peak wavelength.
17 . The method of claim 16 , wherein the second peak wavelength is longer than the first peak wavelength.
18 . The method of claim 11 , further comprising:
using the reflected inspection beam to detect defects in the device under test, and using the reflected autofocus beam to automatically focus an optical inspection tool in which the device under test is located; and
loading the device under test onto a stage in the optical inspection tool and setting a height of the stage to automatically focus the optical inspection tool based on the reflected autofocus beam.
19 . The method of claim 18 , wherein the optical inspection tool further comprises an inspection beam source, an image capture device, an optics assembly containing the field aperture and at least one lens, and an autofocus system containing an autofocus beam source.
20 . The method of claim 11 , wherein the device under test comprises a semiconductor wafer comprising at least one structure or device layer.