Patent Assignment
Reel/Frame 007097/0255
Assignment of Assignor's Interest
Recorded: 1994-08-11
Pages: 4
Assignor
OLIN CORPORATION
Executed: 1994-08-03
Assignee
OCG MICROELECTRONIC MATERIALS, INC.
3 GARRETT MOUNTAIN PLAZA, WEST PATERSON, NEW JERSEY, 07424
Covered Properties
(4)
Photoresist Compositions Containing Selected 6-Acetoxy Cyclohexadienone Photosensitizers and Novolak Resins
Patent:
4,902,603 →
Application:
07/104,697 →
Aqueous Developable Deep Uv Negative Resist Containing Benzannelated Acetic Acid and Novolak Resin
Patent:
5,178,987 →
Application:
07/348,754 →
Aqueous Developable Deep Uv Negative Resist
Patent:
5,258,265 →
Application:
07/980,057 →
Aqueous Developable Deep Uv Negative Resist
Patent:
5,258,260 →
Application:
07/980,076 →
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest.
Oct 5, 1987
From: SLATER, SYDNEY G.; FICNER, STANLEY
To: OLIN CORPORATION, A CORP. OF
Reel/Frame 004794/0223 →
Assignment of Assignors Interest.
Apr 24, 1989
From: SLATER, SYDNEY G.; FICNER, STANLEY A.
To: OLIN CORPORATION, A CORP. OF VA
Reel/Frame 005076/0539 →
Change of Name
Apr 18, 1997
From: OCG MICROELECTRONIC MATERIALS, INC.
To: OLIN MICROELECTRONIC CHEMICALS, INC.
Reel/Frame 008495/0994 →