Patent Assignment
Reel/Frame 008007/0245
Assignment of Assignor's Interest
Recorded: 1996-05-08
Pages: 3
Assignors
TSUTSUI, HIROAKI
Executed: 1996-05-07
MATSUMURA, TAKAO
Executed: 1996-05-07
OIKAWA, HIROKAZU
Executed: 1996-05-07
YOKOI, MASAYUKI
Executed: 1996-05-07
NAKAMURA, JUNICHI
Executed: 1996-05-07
SATO, HIROYUKI
Executed: 1996-05-07
MIZOE, JUN
Executed: 1996-05-07
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Hydrogen Fluoride Vapor Phase Selective Etching Meethod for Fabricating Semiconductor Devices
Patent:
5,922,623 →
Application:
08/646,967 →
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Nov 15, 2002
From: NEC CORPORATION
To: NEC COMPOUND SEMICONDUCTOR DEVICES, LTD.
Reel/Frame 013496/0038 →
Assignment of Assignor's Interest
Apr 4, 2006
From: NEC COMPOUND SEMICONDUCTOR DEVICES, LTD.
To: NEC ELECTRONICS CORPORATION
Reel/Frame 017422/0528 →
Change of Name
Oct 21, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025172/0946 →