Patent Assignment
Reel/Frame 009234/0097
Assignment of Assignor's Interest
Recorded: 1998-06-08
Pages: 3
Assignors
TOMITA, HIROSHI
Executed: 1998-06-02
MURAOKA, HISASHI
Executed: 1998-06-02
TAKEDA, RYUJI
Executed: 1998-06-02
Assignees
KABUSHIKI KAISHA TOSHIBA
72 HORIKAWA-CHO, SAIWAI-KU, KAWASAKI-SHI, JAPAN
PUREX CO., LTD.
735 NIPPA-CHO, KOUHOKU-KU, YOKOHAMA, 223, JAPAN
TOSHIBA CERAMICS CO., LTD.
26-2, 1-CHOME, NISHI-SHINJUKU, SHINJUKU-KU, TOKYO, JAPAN
Covered Property
(1)
Method of and Apparatus for Removing Metallic Impurities Diffused in a Semiconductor Substrate
Patent:
6,054,373 →
Application:
09/006,996 →
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger
Sep 13, 2007
From: TOSHIBA CERAMICS CO., LTD.
To: COVALENT MATERIALS CORPORATION
Reel/Frame 019817/0749 →
Assignment of Assignor's Interest
Mar 11, 2013
From: COVALENT MATERIALS CORPORATION
To: COVALENT SILICON CORPORATION
Reel/Frame 029962/0497 →
Change of Name
Mar 13, 2013
From: COVALENT SILICON CORPORATION
To: GLOBALWAFERS JAPAN CO., LTD.
Reel/Frame 029991/0421 →