Patent Assignment
Reel/Frame 011033/0010
Assignment of Assignor's Interest
Recorded: 2000-08-22
Pages: 4
Assignors
JAING, CHENG-CHUNG
Executed: 2000-08-02
TSAI, CHUEN-HORNG
Executed: 2000-08-03
CHEN, JYH-SHIN
Executed: 2000-08-03
CHENG, MING-HWU
Executed: 2000-08-03
HSIAO, HO-YEN
Executed: 2000-08-02
YEH, PY-SHIUN
Executed: 2000-08-07
KAO, JIANN-SHIUN
Executed: 2000-08-02
Assignee
PRECISION INSTRUMENT DEVELOPMENT CENTER, NATIONAL SCIENCE COUNCIL
HSINCHU SCIENCE-BASED INDUSTRIAL PARK, 20 R&D ROAD VI, HSINCHU, TAIWAN
Covered Property
(1)
Method for in-Situ Monitoring Layer Uniformity of Sputter Coating Based on Intensity Distribution of Plasma Spectrum
Patent:
6,493,070 →
Application:
09/642,793 →
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.