IP Library Assignment 012257/0856
Patent Assignment
Reel/Frame 012257/0856

Assignment of Assignor's Interest

Recorded: 2001-10-15 Pages: 2
Assignor
LEE, SANG-ICK
Executed: 2001-06-23
Assignee
HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
KYOUNGKI-DO, SAN 136-1 AMI-RI, BUBAL-EUB, ICHON-SHI 467-860, KOREA, REPUBLIC OF
Covered Property (1)
Method for the Formation of Gate Electrode of Semiconductor Device Using a Difference in Polishing Selection Ratio Between Polymer and Oxide Film
Patent: 6,391,697 →
Application: 09/855,849 →
Publication: US 2002/0001914
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 9, 2014
From: SK HYNIX INC
To: INTELLECTUAL DISCOVERY CO., LTD.
Reel/Frame 032421/0488 →
Change of Name Mar 9, 2014
From: HYNIX SEMICONDUCTOR, INC.
To: SK HYNIX INC
Reel/Frame 032421/0496 →
Change of Name Mar 9, 2014
From: HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
To: HYNIX SEMICONDUCTOR, INC.
Reel/Frame 032421/0637 →