IP Library Assignment 013206/0642
Patent Assignment
Reel/Frame 013206/0642

Assignment of Assignor's Interest

Recorded: 2002-08-15 Pages: 4
Assignors
HOLSCHER, RICHARD D.
Executed: 2002-08-12
ARDAVAN, NIROOMAND
Executed: 2002-08-12
Assignee
MICRON TECHNOLOGY, INC.
8000 SOUTH FEDERAL WAY, BOISE, IDAHO, 83707-0006
Covered Property (1)
Use of a Dual-Tone Resist to Form Photomasks Including Alignment Mark Protection, Intermediate Semiconductor Device Structures and Bulk Semiconductor Device Substrates
Patent: 6,815,308 →
Application: 10/219,168 →
Publication: US 2004/0032031
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Corrective Assignment Oct 6, 2003
From: NIROOMAND, ARDAVAN
To: MICRON TECHNOLOGY, INC.
Reel/Frame 014559/0512 →