Patent Assignment
Reel/Frame 014559/0512
Corrective Assignment
Recorded: 2003-10-06
Pages: 3
Assignor
NIROOMAND, ARDAVAN
Executed: 2003-09-16
Assignee
MICRON TECHNOLOGY, INC.
8000 SOUTH FEDERAL WAY, BOISE, IDAHO, 83707-0006
Covered Property
(1)
Use of a Dual-Tone Resist to Form Photomasks Including Alignment Mark Protection, Intermediate Semiconductor Device Structures and Bulk Semiconductor Device Substrates
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.