IP Library Assignment 013414/0245
Patent Assignment
Reel/Frame 013414/0245

Assignment of Assignor's Interest

Recorded: 2003-02-05 Pages: 3
Assignor
Assignee
INFINEON TECHNOLOGIES AG
ST. MARTIN-STR. 53, 81541 MUNICH, GERMANY
Covered Property (1)
Method of Forming a Self Aligned Trench in a Semiconductor Using a Patterned Sacrificial Layer for Defining the Trench Opening
Patent: 6,566,219 →
Application: 09/957,937 →
Publication: US 2002/0068400
Related Assignments (6)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 21, 2001
From: REITH, ARMIN
To: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
Reel/Frame 012230/0191 →
Assignment of Assignor's Interest Sep 21, 2001
From: KUNKEL, GERHARD
To: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
Reel/Frame 012230/0194 →
Assignment of Assignor's Interest Jan 14, 2002
From: KUNKEL, GERHARD; REITH, ARMIN M.; BUTT, SHAHID
To: INFINEON TECHNOLOGIES NORTH AMERICA CORP.
Reel/Frame 012548/0702 →
Assignment of Assignor's Interest Jan 14, 2002
From: DIVAKARUNI, RAMACHANDRA; NAEEM, MUNIR D.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 012548/0958 →
Assignment of Assignor's Interest Jan 14, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023788/0535 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →