IP Library Assignment 013499/0744
Patent Assignment
Reel/Frame 013499/0744

Assignment of Assignor's Interest

Recorded: 2002-11-15 Pages: 2
Assignors
YOKOYAMA, YOSHIYUKI
Executed: 2002-10-18
HATTORI, TAKASHI
Executed: 2002-10-11
Assignee
HITACHI, LTD.
6, KANADA SURUGADAI 4-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Radiation-Sensitive Composition and Method for Forming Patterns and Fabricating Semiconductor Devices
Patent: 6,800,423 →
Application: 10/294,618 →
Publication: US 2003/0134232
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 26, 2003
From: HITACHI, LTD.
To: RENESAS TECHNOLOGY CORPORATION
Reel/Frame 014569/0585 →
Merger/Change of Name Aug 31, 2011
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 026837/0505 →