IP Library Assignment 014720/0775
Patent Assignment
Reel/Frame 014720/0775

Assignment of Assignor's Interest

Recorded: 2003-11-24 Pages: 3
Assignors
TAKAOKA, OSAMU
Executed: 2003-10-31
YABE, SATORU
Executed: 2003-10-31
Assignee
SEIKO INSTRUMENTS INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, JAPAN
Covered Property (1)
Mask Defect Repair Method
Patent: 6,703,626 →
Application: 10/047,974 →
Publication: US 2002/0096635
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 9, 2005
From: SEIKO INSTRUMENTS INC.
To: SII NANOTECHNOLOGY INC.
Reel/Frame 015711/0053 →
Change of Name Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →