IP Library Assignment 015910/0845
Patent Assignment
Reel/Frame 015910/0845

Assignment of Assignor's Interest

Recorded: 2005-03-16 Pages: 4
Assignors
TEMMLER, DIETMAR
Executed: 2005-03-09
LORENZ, BARBARA
Executed: 2005-03-09
KOEHLER, DANIEL
Executed: 2005-03-09
FOERSTER, MATTHIAS
Executed: 2005-03-09
Assignee
INFINEON TECHNOLOGIES AG
ST. MARTIN STR. 53, MUNICH, 81669, GERMANY
Covered Property (1)
Method for Filling Trench and Relief Geometries in Semiconductor Structures
Patent: 7,265,025 →
Application: 11/010,186 →
Publication: US 2005/0148171
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 12, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023768/0001 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest Oct 9, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036827/0885 →
Corrective Assignment to Correct the Patent 7105729 Previously Recorded at Reel: 036827 Frame: 0885. Assignor(S) Hereby Confirms the Assignment. Jul 26, 2017
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 043336/0694 →