Patent Assignment
Reel/Frame 016185/0827
Assignment of Assignor's Interest
Recorded: 2005-01-13
Pages: 3
Assignors
XIE, JUN
Executed: 2005-01-06
YAP, HOON LIAN
Executed: 2005-01-06
YEAP, CHUIN BOON
Executed: 2005-01-06
LOK, WEOI SAN
Executed: 2005-01-06
Assignee
CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
60 WOODLANDS INDUSTRIAL PARK D, STREET 2, SINGAPORE, 738406, SINGAPORE
Covered Property
(1)
Method for Reducing Argon Diffusion from High Density Plasma Films
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Nov 20, 2018
From: CHARTERED SEMICONDUCTOR MANUFACTURING PTE. LTD.
To: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
Reel/Frame 047614/0081 →
Assignment of Assignor's Interest
Jul 2, 2019
From: GLOBALFOUNDRIES SINGAPORE PTE. LTD.
To: ALSEPHINA INNOVATIONS INC.
Reel/Frame 049669/0775 →
Assignment of Assignor's Interest
Jul 16, 2020
From: ALSEPHINA INNOVATIONS, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 053351/0839 →