Patent Assignment
Reel/Frame 016764/0805
Assignment of Assignor's Interest
Recorded: 2005-07-13
Pages: 3
Assignors
ROTTSTEGGE, JORG
Executed: 2003-01-09
HOHLE, CHRISTOPH
Executed: 2003-01-07
ESCHBAUMER, CHRISTIAN
Executed: 2003-01-07
SEBALD, MICHAEL
Executed: 2005-01-07
DOMKE, WOLF-DIETER
Executed: 2003-01-13
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STRASSE 53, MUENCHEN, 81669, GERMANY
Covered Property
(1)
Silicon Resist for Photolithography at Short Exposure Wavelengths and Process for Making Photoresists
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest
Oct 7, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036808/0284 →