IP Library Assignment 016766/0546
Patent Assignment
Reel/Frame 016766/0546

Assignment of Assignor's Interest

Recorded: 2005-04-26 Pages: 4
Assignors
HOHLE, CHRISTOPH
Executed: 2005-04-01
DAMMEL, RALPH
Executed: 2005-04-04
HOULIHAN, MICHAEL FRANCIS
Executed: 2005-04-05
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STR. 53, MUNICH, 81669, GERMANY
Covered Property (1)
Photoresist Suitable for Use in 157 Nm Photolithography and Including a Polymer Based on Fluorinated Norbornene Derivatives
Patent: 7,169,531 →
Application: 10/974,726 →
Publication: US 2005/0170279
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 24, 2006
From: HOHLE, CHRISTOPH; DAMMEL, RALPH; HOULIHAN, MICHAEL FRANCIS
To: INFINEON TECHNOLOGIES AG; AZ ELECTRONIC MATERIALS USA CORP.
Reel/Frame 018428/0098 →
Assignment of Assignor's Interest Jan 14, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023853/0401 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →