Patent Assignment
Reel/Frame 018428/0098
Assignment of Assignor's Interest
Recorded: 2006-10-24
Pages: 5
Assignors
HOHLE, CHRISTOPH
Executed: 2005-04-01
DAMMEL, RALPH
Executed: 2005-04-04
HOULIHAN, MICHAEL FRANCIS
Executed: 2005-04-05
Assignees
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STR. 53, MUNICH, 81669, GERMANY
AZ ELECTRONIC MATERIALS USA CORP.
70 MEISTER AVENUE, SOMERVILLE, NEW JERSEY, 08876
Covered Property
(1)
Photoresist Suitable for Use in 157 Nm Photolithography and Including a Polymer Based on Fluorinated Norbornene Derivatives
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Apr 26, 2005
From: HOHLE, CHRISTOPH; DAMMEL, RALPH; HOULIHAN, MICHAEL FRANCIS
To: INFINEON TECHNOLOGIES AG
Reel/Frame 016766/0546 →
Assignment of Assignor's Interest
Jan 14, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023853/0401 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →