IP Library Assignment 016876/0826
Patent Assignment
Reel/Frame 016876/0826

Assignment of Assignor's Interest

Recorded: 2005-12-09 Pages: 6
Assignors
GAUGLITZ, HEIKE
Executed: 2005-11-01
GEHRE, MICHAEL
Executed: 2005-10-24
HAHMANN, DR. PETER
Executed: 2005-10-24
HOPP, MICHAEL
Executed: 2005-10-24
MELZER, DETLEF
Executed: 2005-10-24
Assignee
LEICA MICROSYSTEMS LITHOGRAPHY GMBH
GOESCHWITZER STRASSE 25, JENA, 07745, GERMANY
Covered Property (1)
Method for Exposing a Substrate with a Beam
Application: 11/289,030 →
Publication: US 2006/0121396
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 5, 2008
From: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
To: VISTEC ELECTRON BEAM GMBH
Reel/Frame 021478/0806 →