Patent Assignment
Reel/Frame 021478/0806
Change of Name
Recorded: 2008-09-05
Pages: 11
Assignor
LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Executed: 2006-02-22
Assignee
VISTEC ELECTRON BEAM GMBH
GOESCHWITZER STRASSE 25, JENA, 07745, GERMANY
Covered Properties
(10)
Device for Electrostatic Deflection of a Particle Beam
Patent:
6,541,776 →
Application:
09/510,959 →
Method and Device for Exposing a Substrate to Light
Patent:
6,600,162 →
Application:
09/600,477 →
Holding Device for a Substrate
Patent:
6,426,860 →
Application:
09/600,630 →
Method for Exposing a Layout Comprising Multiple Layers on a Wafer
Device and Method for Maskless Afm Microlithography
Process for Controlling the Proximity Effect Correction
Method for Reducing the Fogging Effect
Device and Method for Imaging a Multiple Particle Beam on a Substrate
Method for Exposing a Substrate with a Beam
Application:
11/289,030 →
Publication:
US 2006/0121396
Electrostatic Deflection System for Corpuscular Radiation
Related Assignments
(13)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 22, 2000
From: DORING, HANS-JOACHIM; ELSTER, THOMAS
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 010578/0953 →
Assignment of Assignor's Interest
Sep 19, 2000
From: SCHUBERT, GERHARD; KIRSCHSTEIN, ULF-CARSTEN; RISSE, STEFAN; HARNISCH, GERD
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 011086/0495 →
Assignment of Assignor's Interest
Sep 21, 2000
From: HAHMANN, PETER; BEYER, DIRK; KRAUHS, DOROTHEE; ELSTER, THOMAS
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 011100/0381 →
Assignment of Assignor's Interest
Aug 13, 2001
From: HAHMANN, PETER; BERGMANN, ECKART
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 012069/0594 →
Assignment of Assignor's Interest
Oct 20, 2005
From: HUDEK, PETER; BEYER, DIRK
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 016918/0061 →
Assignment of Assignor's Interest
Oct 20, 2005
From: HUDEK, PETER; BEYER, DIRK; MELCHIOR, LEMKE
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 016918/0087 →
Assignment of Assignor's Interest
Nov 22, 2005
From: HEINITZ, JOACHIM; SCHUBERT, ANDREAS
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 016808/0731 →
Assignment of Assignor's Interest
Dec 9, 2005
From: GAUGLITZ, HEIKE; GEHRE, MICHAEL; HAHMANN, DR. PETER; HOPP, MICHAEL
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 016876/0826 →
Assignment of Assignor's Interest
Feb 3, 2006
From: RISSE, STEFAN; PESCHEL, THOMAS; DAMM, CHRISTOPH; GEBHARDT, ANDREAS
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
Reel/Frame 017548/0161 →
Assignment of Assignor's Interest
Dec 21, 2006
From: RANGELOW, IVO; IVANOV, TZWETAN; HUDEK, PETER; FORTAGNE, OLAF
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH; UNIVERSITAET KASSEL
Reel/Frame 018654/0852 →
Assignment of Assignor's Interest
Feb 25, 2014
From: VISTEC ELECTRON BEAM GMBH
To: RANGELOW, IVO, DR.
Reel/Frame 032290/0281 →
Assignment of Assignor's Interest
Aug 4, 2020
From: UNIVERSITAET KASSEL
To: RANGELOW, IVO, DR.
Reel/Frame 053392/0635 →
Assignment of Assignor's Interest
Aug 5, 2020
From: RANGELOW, IVO, DR
To: PARCAN NANOTECH CO. LTD.
Reel/Frame 053412/0525 →