IP Library › Assignment 032290/0281
Patent Assignment
Reel/Frame 032290/0281

Assignment of Assignor's Interest

Recorded: 2014-02-25 Pages: 2
Assignor
VISTEC ELECTRON BEAM GMBH
Executed: 2014-02-13
Assignee
RANGELOW, IVO, DR.
OBERE SOMMERBACHSTRASSE 45, BAUNATAL, D-34225, GERMANY
Covered Property (1)
Device and Method for Maskless Afm Microlithography
Patent: 7,141,808 →
Application: 10/508,478 →
Publication: US 2005/0225011
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Dec 21, 2006
From: RANGELOW, IVO; IVANOV, TZWETAN; HUDEK, PETER; FORTAGNE, OLAF
To: LEICA MICROSYSTEMS LITHOGRAPHY GMBH; UNIVERSITAET KASSEL
Reel/Frame 018654/0852 →
Change of Name Sep 5, 2008
From: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
To: VISTEC ELECTRON BEAM GMBH
Reel/Frame 021478/0806 →
Assignment of Assignor's Interest Aug 4, 2020
From: UNIVERSITAET KASSEL
To: RANGELOW, IVO, DR.
Reel/Frame 053392/0635 →
Assignment of Assignor's Interest Aug 5, 2020
From: RANGELOW, IVO, DR
To: PARCAN NANOTECH CO. LTD.
Reel/Frame 053412/0525 →