IP Library Assignment 018654/0852
Patent Assignment
Reel/Frame 018654/0852

Assignment of Assignor's Interest

Recorded: 2006-12-21 Pages: 11
Assignors
RANGELOW, IVO
Executed: 2006-12-01
IVANOV, TZWETAN
Executed: 2006-12-05
HUDEK, PETER
Executed: 2006-10-25
FORTAGNE, OLAF
Executed: 2006-10-23
Assignees
LEICA MICROSYSTEMS LITHOGRAPHY GMBH
GOESCHWITZER STRASSE 25, JENA, D-07745, GERMANY
UNIVERSITAET KASSEL
MOENCHEBERGSTRASSE 19, KASSEL, D-34109, GERMANY
Covered Property (1)
Device and Method for Maskless Afm Microlithography
Patent: 7,141,808 →
Application: 10/508,478 →
Publication: US 2005/0225011
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Sep 5, 2008
From: LEICA MICROSYSTEMS LITHOGRAPHY GMBH
To: VISTEC ELECTRON BEAM GMBH
Reel/Frame 021478/0806 →
Assignment of Assignor's Interest Feb 25, 2014
From: VISTEC ELECTRON BEAM GMBH
To: RANGELOW, IVO, DR.
Reel/Frame 032290/0281 →
Assignment of Assignor's Interest Aug 4, 2020
From: UNIVERSITAET KASSEL
To: RANGELOW, IVO, DR.
Reel/Frame 053392/0635 →
Assignment of Assignor's Interest Aug 5, 2020
From: RANGELOW, IVO, DR
To: PARCAN NANOTECH CO. LTD.
Reel/Frame 053412/0525 →