Patent Assignment
Reel/Frame 017417/0192
Assignment of Assignor's Interest
Recorded: 2006-01-03
Pages: 4
Assignors
NOLSCHER, CHRISTOPH
Executed: 2003-02-11
SEMMLER, ARMIN
Executed: 2003-02-07
CZECH, GUNTHER
Executed: 2003-03-03
Assignee
INFINEON TECHNOLOGIES AG
ST.-MARTIN-STRASSE 53, MUENCHEN, D-81669, GERMANY
Covered Property
(1)
Photomask and Method of Structuring a Photoresist by Double Exposure with Imaging Auxiliary Structures and Different Exposure Tools
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023773/0457 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest
Oct 7, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036808/0284 →