Patent Assignment
Reel/Frame 017417/0384
Assignment of Assignor's Interest
Recorded: 2006-01-04
Pages: 5
Assignors
ROTTSTEGGE, JORG
Executed: 2003-04-10
HERBST, WALTRAUD
Executed: 2003-04-06
FALK, GERTRUD
Executed: 2003-03-27
KUHN, EBERHARD
Executed: 2003-03-27
Assignee
INFINEON TECHNOLOGIES AG
ST. -MARTIN-STRASSE 53, MUENCHEN, 81669, GERMANY
Covered Property
(1)
Process for Increasing the Etch Resistance and for Reducing the Hole and Trench Width of a Photoresist Structure Using Solvent Systems of Low Polarity
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 15, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023796/0001 →
Assignment of Assignor's Interest
May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest
Oct 8, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036818/0583 →