Patent Assignment
Reel/Frame 017846/0921
Assignment of Assignor's Interest
Recorded: 2006-06-29
Received: 2006-06-29
Pages: 6
Assignor
UNIVERSITY OF SASKATCHEWAN TECHNOLOGIES INC.
Executed: 2006-02-02
Assignee
UNIVERSITY OF SASKATCHEWAN
110 GYMNASIUM PLACE, BOX 5000 RPO UNIVERSITY, SASKATOON, SKC, S7N 4J8, CA
Covered Properties
(13)
Chemical switching of nucleic acid circuit elements
Application:
10/540,279 →
Nucleic acid mismatch detection
Application:
10/547,862 →
Polishing Pad for Use in Chemical/Mechanical Planarization of Semiconductor Wafers Having a Transparent Window for End-Point Determination and Method of Making
Application:
11/091,965 →
Retaining Ring with Wear Pad for Use in Chemical Mechanical Planarization
Application:
10/924,715 →
Optical Dispersion Correction in Transimpedance Amplifiers
Application:
10/841,948 →
Method for Securing a Polishing Pad to a Platen for Use in Chemical-Mechanical Polishing of Wafers
Application:
10/616,514 →
Gradient Polishing Pad Made from Paper-Making Fibers for Use in Chemical/Mechanical Planarization of Wafers
Application:
10/464,821 →
Polishing Pad for Use in Chemical/Mechanical Planarization of Semiconductor Wafers Having a Transparent Window for End-Point Determination and Method of Making
Application:
10/390,555 →
Polishing Pad for Use in Chemical-Mechanical Planarization of Semiconductor Wafers and Method of Making Same
Application:
10/349,200 →
Retaining Ring with Wear Pad for Use in Chemical Mechanical Planarization
Application:
10/156,655 →
Nucleic acid circuit elements and methods
Application:
10/153,875 →
Polishing Pad for Use in Chemical - Mechanical Palanarization of Semiconductor Wafers and Method of Making Same
Application:
10/087,223 →
Biologically Active Metal-Containing Nucleic Acids
Application:
10/061,979 →