IP Library › Assignment 018744/0407
Patent Assignment
Reel/Frame 018744/0407

Assignment of Assignor's Interest

Recorded: 2007-01-11 Pages: 2
Assignors
ELIAN, KLAUS
Executed: 2003-03-19
SEBALD, MICHAEL
Executed: 2003-03-19
Assignee
INFINEON TECHNOLOGIES AG
ST-MARTIN-STRASSE 53, MUENCHEN, 81669, GERMANY
Covered Property (1)
Resist for Electron Beam Lithography and a Process for Producing Photomasks Using Electron Beam Lithography
Patent: 7,220,531 →
Application: 10/376,904 →
Publication: US 2003/0165752
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 15, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023796/0001 →
Assignment of Assignor's Interest May 8, 2015
From: QIMONDA AG
To: INFINEON TECHNOLOGIES AG
Reel/Frame 035623/0001 →
Assignment of Assignor's Interest Oct 8, 2015
From: INFINEON TECHNOLOGIES AG
To: POLARIS INNOVATIONS LIMITED
Reel/Frame 036818/0583 →