IP Library Assignment 020041/0107
Patent Assignment
Reel/Frame 020041/0107

Assignment of Assignor's Interest

Recorded: 2007-10-31 Pages: 3
Assignors
IIZUKA, TOSHIHIRO
Executed: 2002-06-13
YAMAMOTO, TOMOE
Executed: 2002-06-13
TODA, MAMI
Executed: 2002-06-13
YAMAMICHI, SHINTARO
Executed: 2002-06-13
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Method for Fabricating a Metal-Insulator-Metal (Mim) Capacitor Having Capacitor Dielectric Layer Formed by Atomic Layer Deposition (Ald)
Patent: 8,815,678 →
Application: 11/928,460 →
Publication: US 2008/0064147
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Nov 2, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025235/0321 →
Assignment of Assignor's Interest Jul 8, 2014
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 033256/0201 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →