IP Library Assignment 033256/0201
Patent Assignment
Reel/Frame 033256/0201

Assignment of Assignor's Interest

Recorded: 2014-07-08 Pages: 2
Assignor
NEC CORPORATION
Executed: 2002-11-01
Assignee
NEC ELECTRONICS CORPORATION
1753 SHIMONUMABE, NAKAHARA-KU, KAWASAKI, KANAGAWA, 211-8668, JAPAN
Covered Property (1)
Method for Fabricating a Metal-Insulator-Metal (Mim) Capacitor Having Capacitor Dielectric Layer Formed by Atomic Layer Deposition (Ald)
Patent: 8,815,678 →
Application: 11/928,460 →
Publication: US 2008/0064147
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 31, 2007
From: IIZUKA, TOSHIHIRO; YAMAMOTO, TOMOE; TODA, MAMI; YAMAMICHI, SHINTARO
To: NEC CORPORATION
Reel/Frame 020041/0107 →
Change of Name Nov 2, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025235/0321 →
Change of Address Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →