IP Library Assignment 021600/0830
Patent Assignment
Reel/Frame 021600/0830

Assignment of Assignor's Interest

Recorded: 2008-09-29 Pages: 4
Assignors
WANG, FAN
Executed: 2008-08-18
MA, MINGYING
Executed: 2008-08-18
WANG, XIANGZHAO
Executed: 2008-08-18
Assignee
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
1525 ZHANGDONG ROAD, ZHANGJIANG HIGH-TECH PARK, SHANGHAI, 201203, CHINA
Covered Property (1)
Method for in-Situ Aberration Measurement of Optical Imaging System in Lithographic Tools
Patent: 8,035,801 →
Application: 12/295,108 →
Publication: US 2010/0177294
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 30, 2017
From: SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
To: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
Reel/Frame 043517/0989 →
Corrective Assignment to Correct the Application Serial Number Previously Recorded at Reel: 043517 Frame: 0989. Assignor(S) Hereby Confirms the Assignment. Mar 29, 2019
From: SHANGHAI MICRO ELECTRONICS EQUPIMENT CO., LTD.
To: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
Reel/Frame 048745/0860 →