Patent Assignment
Reel/Frame 022213/0553
Assignment of Assignor's Interest
Recorded: 2009-02-05
Pages: 2
Assignors
YAMAMOTO, HIRONORI
Executed: 2008-09-09
ITO, FUMINORI
Executed: 2008-09-09
HAYASHI, YOSHIHIRO
Executed: 2008-09-09
Assignee
NEC CORPORATION
7-1, SHIBA 5-CHOME, MINATO-KU, TOKYO, 108-8001, JAPAN
Covered Property
(1)
Method for Forming Interlayer Dielectric Film, Interlayer Dielectric Film, Semiconductor Device and Semiconductor Manufacturing Apparatus
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Jun 11, 2010
From: NEC CORPORATION
To: NEC ELECTRONICS CORPORATION
Reel/Frame 024524/0463 →
Change of Name
Oct 28, 2010
From: NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025214/0304 →
Change of Address
Nov 29, 2017
From: RENESAS ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 044928/0001 →