Patent Assignment
Reel/Frame 022642/0642
Assignment of Assignor's Interest
Recorded: 2009-05-01
Pages: 3
Assignors
HAGIWARA, RYOJI
Executed: 2009-04-13
TAKAOKA, OSAMU
Executed: 2009-04-13
KOZAKAI, TOMOKAZU
Executed: 2009-04-13
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MINATO-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Method for Fabricating Euvl Mask
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →