IP Library Assignment 023651/0404
Patent Assignment
Reel/Frame 023651/0404

Assignment of Assignor's Interest

Recorded: 2009-12-14 Pages: 3
Assignors
KITAMURA, TADASHI
Executed: 2009-12-07
ISHIKAWA, AKIO
Executed: 2009-12-07
Assignee
NANOGEOMETRY RESEARCH INC.
#303, 2-9-6 NAGATA-CHO, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Defect and Critical Dimension Analysis Systems and Methods for a Semiconductor Lithographic Process
Patent: 8,422,761 →
Application: 12/637,331 →
Publication: US 2010/0158345
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Nov 16, 2010
From: NANOGEOMETRY RESEARCH, INC.
To: NGR INC.
Reel/Frame 025376/0162 →
Change of Address Oct 30, 2017
From: NGR INC.
To: NGR INC.
Reel/Frame 044324/0817 →
Change of Name Jan 14, 2020
From: NGR INC.
To: TASMIT, INC.
Reel/Frame 051590/0962 →