Patent Assignment
Reel/Frame 024076/0389
Corrective Assignment to Correct the the Inventors First Name Is Misspelled on the Notice of Recordation of Assignment Previously Recorded on Reel 023431 Frame 0370. Assignor(S) Hereby Confirms the Assignment to S.O.I.Tec Silicon on Insulator Technologies, S.a. Dated 9/25/2009.
Recorded: 2010-03-14
Pages: 6
Assignor
ARENA, CHANTAL
Executed: 2009-09-25
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES, S.A.
CHEMIN DES FRANQUES, PARC TECHNOLOGIQUE DES FONTAINES, BERNIN, 38190, FRANCE
Covered Property
(1)
Methods of Forming Layers of Semiconductor Material Having Reduced Lattice Strain, Semiconductor Structures, Devices and Engineered Substrates Including Same
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Oct 27, 2009
From: ARENA, CHANTEL
To: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES, S.A.
Reel/Frame 023431/0370 →
Change of Name
Feb 28, 2012
From: S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES; CHEMIN DES FRANQUES; PARC TECHNOLOGIES DES FONTAINES; BERNIN. FRANCE 38190
To: SOITEC
Reel/Frame 028138/0895 →