Patent Assignment
Reel/Frame 024113/0195
Assignment of Assignor's Interest
Recorded: 2010-03-19
Pages: 4
Assignors
KAITO, TAKASHI
Executed: 2010-03-12
NAKAGAWA, YOSHITOMO
Executed: 2010-03-12
TASHIRO, JUNICHI
Executed: 2010-03-12
SUGIYAMA, YASUHIKO
Executed: 2010-03-12
FUJII, TOSHIAKI
Executed: 2010-03-12
AITA, KAZUO
Executed: 2010-03-12
OGAWA, TAKASHI
Executed: 2010-03-12
Assignee
SII NANOTECHNOLOGY INC.
8, NAKASE 1-CHOME, MIHAMA-KU, CHIBA-SHI, CHIBA, 261-8507, JAPAN
Covered Property
(1)
Composite Focused Ion Beam Device, Process Observation Method Using the Same,and Processing Method
Related Assignments
(3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name
Sep 25, 2014
From: SII NANOTECHNOLOGY INC.
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033817/0078 →
Change of Address
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0543 →
Change of Name
Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072907/0356 →