Patent Assignment
Reel/Frame 024513/0608
Security Agreement
Recorded: 2010-06-10
Pages: 3
Assignors
MAPPER LITHOGRAPHY HOLDING B.V.
Executed: 2010-02-17
MAPPER LITHOGRAPHY B.V.
Executed: 2010-02-17
MAPPER LITHOGRAPHY IP B.V.
Executed: 2010-02-17
Assignee
HOWREY LLP
AMSTELPLEIN 1, REMBRANDTTOREN - 31ST FLOOR, AMSTERDAM, 1096 HA, NETHERLANDS
Covered Properties
(4)
Charged Particle Optical System Comprising an Electrostatic Deflector
Capacitive Sensing System
Application:
61/291,411 →
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Application:
61/306,199 →
Substrate Support Structure, Clamp Preparation Unit, and Lithography System
Application:
61/310,303 →
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jul 9, 2010
From: BAARS, NORMAN HENDRIKUS RUDOLF; TEN BERGE, GERARDUS FERNANDUS; STEENBRINK, STIJN WILLEM HERMAN KAREL
To: MAPPER LITHOGRAPHY IP B.V.
Reel/Frame 024656/0881 →
Court Appointment
May 7, 2019
From: MAPPER LITHOGRAPHY HOLDING B.V.; MAPPER LITHOGRAPHY IP B.V.; MAPPER LITHOGRAPHY B.V.
To: WITTEKAMP, J.J.
Reel/Frame 049104/0734 →
Assignment of Assignor's Interest
May 7, 2019
From: WITTEKAMP, J.J.
To: ASML NETHERLANDS B.V.
Reel/Frame 049296/0606 →