IP Library Assignment 024586/0374
Patent Assignment
Reel/Frame 024586/0374

Assignment of Assignor's Interest

Recorded: 2010-06-24 Pages: 4
Assignors
TAKAHATA, MASAHIRO
Executed: 2010-06-15
SHINDO, YUICHIRO
Executed: 2010-06-15
KANOU, GAKU
Executed: 2010-06-15
Assignee
NIPPON MINING & METALS CO., LTD.
10-1, TORANOMON 2-CHOME, MINATO-KU, TOKYO, 105-0001, JAPAN
Covered Property (1)
High-Purity Lanthanum, Sputtering Target Comprising High-Purity Lanthanum, and Metal Gate Film Mainly Comprising High-Purity Lanthanum
Patent: 8,980,169 →
Application: 12/810,319 →
Publication: US 2010/0272596
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Oct 8, 2010
From: NIPPON MINING & METALS CO., LTD.
To: NIPPON MINING HOLDINGS, INC.
Reel/Frame 025115/0675 →
Change of Name Oct 12, 2010
From: NIPPON MINING HOLDINGS, INC.
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 025123/0420 →
Change of Address Feb 7, 2017
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 041649/0733 →
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →