Patent Assignment
Reel/Frame 024785/0196
Change of Name
Recorded: 2010-08-04
Pages: 13
Assignor
FUJITSU MICROELECTRONICS LIMITED
Executed: 2010-04-01
Assignee
FUJITSU SEMICONDUCTOR LIMITED
2-10-23 SHIN YOKOHAMA, KOHOKU-KU, YOKOHAMA-SHI, KANAGAWA 222-0033, JAPAN
Covered Property
(1)
Coating Liquid for Forming Low-Permittivity Silica Film and Substrate Having Low-Permittivity Coating Film
Patent:
6,261,357 →
Application:
09/155,234 →
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 23, 1998
From: EGAMI, MIKI; NAKASHIMA, AKIRA; KOMATSU, MICHIO
To: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.; FUJITSU LIMITED
Reel/Frame 009723/0301 →
Assignment of Assignor's Interest
Feb 13, 2009
From: FUJITSU LIMITED
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 022248/0521 →
Change of Name
Mar 11, 2009
From: CATALYSTS AND CHEMICALS INDUSTRIES CO., LTD.
To: JGC CATALYSTS AND CHEMICALS LTD.
Reel/Frame 022368/0621 →
Change of Assignee Address
Nov 16, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 040626/0489 →