IP Library Assignment 040626/0489
Patent Assignment
Reel/Frame 040626/0489

Change of Assignee Address

Recorded: 2016-11-16 Pages: 3
Assignor
FUJITSU SEMICONDUCTOR LIMITED
Executed: 2016-11-16
Assignee
FUJITSU SEMICONDUCTOR LIMITED
2-100-45 SHIN-YOKOHAMA, KOHOKU-KU, YOKOHAMA-SHI,, KANAGAWA, 222-0033, JAPAN
Covered Property (1)
Coating Liquid for Forming Low-Permittivity Silica Film and Substrate Having Low-Permittivity Coating Film
Patent: 6,261,357 →
Application: 09/155,234 →
Related Assignments (4)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 23, 1998
From: EGAMI, MIKI; NAKASHIMA, AKIRA; KOMATSU, MICHIO
To: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.; FUJITSU LIMITED
Reel/Frame 009723/0301 →
Assignment of Assignor's Interest Feb 13, 2009
From: FUJITSU LIMITED
To: FUJITSU MICROELECTRONICS LIMITED
Reel/Frame 022248/0521 →
Change of Name Mar 11, 2009
From: CATALYSTS AND CHEMICALS INDUSTRIES CO., LTD.
To: JGC CATALYSTS AND CHEMICALS LTD.
Reel/Frame 022368/0621 →
Change of Name Aug 4, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024785/0196 →