IP Library Assignment 024898/0646
Patent Assignment
Reel/Frame 024898/0646

Assignment of Assignor's Interest

Recorded: 2010-08-27 Pages: 2
Assignors
GAO, DAVID
Executed: 2010-02-23
MIENO, FUMITAKE
Executed: 2010-01-26
Assignee
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
18 ZHANG JIANG ROAD, PUDONG NEW AREA, SHANGHAI, 201203, CHINA
Covered Property (1)
Method of Rapid Thermal Treatment Using High Energy Electromagnetic Radiation of a Semiconductor Substrate for Formation of Epitaxial Materials
Patent: 8,309,472 →
Application: 12/869,620 →
Publication: US 2011/0065281
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Jan 14, 2013
From: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
To: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION; SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
Reel/Frame 029625/0763 →