IP Library › Assignment 025657/0673
Patent Assignment
Reel/Frame 025657/0673

Assignment of Assignor's Interest

Recorded: 2011-01-19 Pages: 2
Assignor
HIROTA, KOUSA
Executed: 2010-12-01
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Apparatus
Patent: 8,500,912 →
Application: 13/008,993 →
Publication: US 2012/0085366
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →