Patent Assignment
Reel/Frame 025857/0517
A Modifying Conversion
Recorded: 2011-02-28
Pages: 7
Assignor
CARL ZEISS SMT AG
Executed: 2010-10-14
Assignee
CARL ZEISS SMT GMBH
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
Covered Property
(1)
Optical System for a Microlithographic Projection Exposure Apparatus and Microlithographic Exposure Method
Application:
12/851,074 →
Publication:
US 2011/0063597
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.