IP Library Assignment 027125/0494
Patent Assignment
Reel/Frame 027125/0494

Assignment of Assignor's Interest

Recorded: 2011-10-26 Pages: 3
Assignor
NAKAMURA, MASAHIRO
Executed: 2011-10-21
Assignee
ZEON CORPORATION
1-6-2 MARUNOUCHI, CHIYODA-KU, TOKYO, 100-8246, JAPAN
Covered Property (1)
Low Energy Etch Process for Nitrogen-Containing Dielectric Layer
Patent: 9,190,316 →
Application: 13/281,732 →
Publication: US 2013/0105996
Related Assignments (6)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Oct 26, 2011
From: BRINK, MARKUS; BRUCE, ROBERT L.; ENGELMANN, SEBASTIAN U.; FULLER, NICHOLAS C.M.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 027125/0475 →
Assignment of Assignor's Interest Sep 3, 2015
From: INTERNATIONAL BUSINESS MACHINES CORPORATION
To: GLOBALFOUNDRIES U.S. 2 LLC
Reel/Frame 036550/0001 →
Assignment of Assignor's Interest Oct 5, 2015
From: GLOBALFOUNDRIES U.S. 2 LLC; GLOBALFOUNDRIES U.S. INC.
To: GLOBALFOUNDRIES INC.
Reel/Frame 036779/0001 →
Security Agreement Nov 29, 2018
From: GLOBALFOUNDRIES INC.
To: WILMINGTON TRUST, NATIONAL ASSOCIATION
Reel/Frame 049490/0001 →
Release of Security Interest Nov 20, 2020
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES INC.
Reel/Frame 054636/0001 →
Release of Security Interest May 12, 2021
From: WILMINGTON TRUST, NATIONAL ASSOCIATION
To: GLOBALFOUNDRIES U.S. INC.
Reel/Frame 056987/0001 →