Patent Assignment
Reel/Frame 027654/0244
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded: 2012-02-03
Received: 2012-02-03
Pages: 5
Covered Applications
(18)
Semiconductor on Insulator Semiconductor Device and Method of Manufacture
App. No. 11/629,419
→
SEMICONDUCTOR SUBSTRATE WITH SOLID PHASE EPITAXIAL REGROWTH WITH REDUCED DEPTH OF DOPING PROFILE AND METHOD OF PRODUCING SAME
App. No. 10/596,603
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METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SUCH A SEMICONDUCTOR DEVICE
App. No. 11/574,338
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SEMICONDUCTOR DEVICE HAVING A POLYSILICON ELECTRODE INCLUDING AMORPHIZING, RECRYSTALLISING, AND REMOVING PART OF THE POLYSILICON ELECTRODE
App. No. 11/917,103
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SEMICONDUCT DEVICE AND METHOD OF MANUFACTURING SUCH A SEMICONDUCTOR DEVICE
App. No. 11/574,245
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SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOF
App. No. 11/574,341
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PLANAR DUAL GATE SEMICONDUCTOR DEVICE
App. No. 11/597,816
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METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING DOPANT INTRODUCTION
App. No. 10/598,744
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FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING A FIELD EFFECT TRANSISTOR
App. No. 10/598,755
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SEMICONDUCTOR SUBSTRATE WITH SOLID PHASE EPITAXIAL REGROWTH WITH REDUCED JUNCTION LEAKAGE AND METHOD OF PRODUCING SAME
App. No. 10/596,612
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METHOD FOR FORMING A STRAINED SI-CHANNEL IN A MOSFET STRUCTURE
App. No. 10/596,422
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Semiconductor device and method of manufacturing such a semiconductor device
App. No. 10/575,288
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METHOD OF FABRICATING A DOUBLE GATE FIELD EFFECT TRANSISTOR DEVICE, AND SUCH A DOUBLE GATE FIELD EFFECT TRANSISTOR DEVICE
App. No. 10/570,478
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Formation of junctions and silicides with reduced thermal budget
App. No. 10/559,069
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Gate electrode for semiconductor devices
App. No. 10/550,741
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METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE OBTAINED BY MEANS OF SUCH A METHOD
App. No. 10/544,412
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METHOD OF MANUFACTURING MOS TRANSISTORS WITH GATE ELECTRODES FORMED IN A PACKET OF METAL LAYERS DEPOSITED UPON ONE ANOTHER
App. No. 10/544,413
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Method of manufacturing a semiconductor device and semiconductor device obatined with such a method
App. No. 10/539,224
→