IP Library › Assignment 027992/0117
Patent Assignment
Reel/Frame 027992/0117

Assignment of Assignor's Interest

Recorded: 2012-04-05 Pages: 3
Assignor
IKEDA, KEIJI
Executed: 2012-02-10
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 1058001, JAPAN
Covered Property (1)
Method of Manufacturing Semiconductor Device Having Pre-Silicide Nitrogen Implant
Patent: 8,679,961 →
Application: 13/336,307 →
Publication: US 2012/0164800
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Sep 11, 2019
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050339/0573 →
Merger and Change of Name Sep 13, 2019
From: TOSHIBA MEMORY CORPORATION; K. K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 050494/0645 →
Change of Name and Address Apr 20, 2020
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 052436/0702 →