Patent Assignment
Reel/Frame 029996/0682
Assignment of Assignor's Interest
Recorded: 2013-03-14
Pages: 4
Assignors
TANIMOTO, AKITOSHI
Executed: 2013-02-22
NOBE, SHIGERU
Executed: 2013-02-22
KASUYA, KEI
Executed: 2013-02-22
MATSUTANI, HIROSHI
Executed: 2013-01-22
UENO, TAKUMI
Executed: 2013-02-22
AOKI, YU
Executed: 2013-02-22
TAHARA, SHINGO
Executed: 2013-02-22
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME,, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property
(1)
Positive Photosensitive Resin Composition, Method of Creating Resist Pattern, and Electronic Component
Related Assignments
(4)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address of Assignee
Jul 18, 2014
From: HITACHI CHEMICAL COMPANY, LTD.
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 033360/0510 →
Change of Name
Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name
Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address
Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →